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Patent Searching and Data


Title:
モノマーの真空蒸着と重合とによって得られた静電荷散逸性材料
Document Type and Number:
Japanese Patent JP2013506061
Kind Code:
A
Abstract:
The present invention relates to a process for making electrostatic charge dissipative material comprising the following steps: (a) optionally pretreating a substrate in a plasma field; (b) flash evaporating at least one monomer and at least one hygroscopic additive into a vacuum chamber to produce a vapor; (c) condensing the vapor on the substrate to produce a film of the monomer and the hygroscopic additive coating on the substrate; and (d) curing the monomer of the film to produce a polymeric layer containing hygroscopic additive on the substrate; wherein the condensing step is carried out under vapor-density and residence-time conditions that limit the polymeric layer to a maximum thickness of about 3.0 μm. The electrostatic charge dissipative material can be used to protect electrostatic sensitive electronic components.

Inventors:
Bisbis Ben Youssef
Brethoss Ioannis Vie
Braves Noel Stephen
Application Number:
JP2012532115A
Publication Date:
February 21, 2013
Filing Date:
September 17, 2010
Export Citation:
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Assignee:
E.I.DU PONT DE NEMOURS AND COMPANY
International Classes:
D06M14/18; C08J7/18; D06M10/02; D06M14/00; D06M15/263
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Atsushi Hakoda
Kenji Asai
Kazuo Yamazaki
Satsuki Ichikawa