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Patent Searching and Data


Title:
Electrostatic remote plasma source
Document Type and Number:
Japanese Patent JP5905906
Kind Code:
B2
Abstract:
This disclosure describes systems, methods, and apparatus for capacitively coupling energy into a plasma to ignite and sustain the plasma within a remote plasma source. The power is provided by a first electrode that at least partially surrounds or is surrounded by a second electrode. The second electrode can be grounded or floating. First and second dielectric components can be arranged to separate one or both of the electrodes from the plasma and thereby DC isolate the plasma from one or both of the electrodes.

Inventors:
Hoffman, Daniel Jay.
Carter, daniel
Brooke, victor
Karen Peterson
Grilly, randy
Application Number:
JP2013551290A
Publication Date:
April 20, 2016
Filing Date:
January 24, 2012
Export Citation:
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Assignee:
Advanced Energy Industries, Inc.
International Classes:
H05H1/46; C23C16/505; H01L21/3065
Domestic Patent References:
JP2005322416A
JP6219718A
JP2008506235A
JP2008041495A
JP2001028298A
Foreign References:
WO2006103945A1
WO2007040020A1
WO2010138105A1
Attorney, Agent or Firm:
Hidesaku Yamamoto
Natsuki Morishita