Title:
ELECTROSTATICALLY ATTRACTABLE TRANSPARENT INSULATING SUBSTRATE
Document Type and Number:
Japanese Patent JP2000188279
Kind Code:
A
Abstract:
To provide an insulating substrate which can be set to a highly uniform temperature distribution and can obtain a highly uniform worked or formed film distribution.
On the surface which is brought into contact with the upper surface of an electrostatic chuck electrode 12 provided on a substrate electrode 9, namely, on the rear surface of a transparent insulating substrate 16, a transparent conductive film composed of an oxide film or a nitride or metallic thin film, the composition of which is controlled so that the light transmittance of the film in the visible region becomes ≥80% and the electrical resistivity of the film becomes ≤1012 Ωcm, is formed.
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Inventors:
HAYASHI TOSHIO
FUWA KO
FUWA KO
Application Number:
JP36270698A
Publication Date:
July 04, 2000
Filing Date:
December 21, 1998
Export Citation:
Assignee:
ULVAC CORP
International Classes:
H01L21/302; H01L21/205; H01L21/3065; (IPC1-7): H01L21/3065; H01L21/205
Attorney, Agent or Firm:
Shigeru Yagita (3 outside)
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