ELEMENT SUBSTRATE, INSPECTION METHOD OF ELEMENT, MANUFACTURING METHOD OF ELEMENT, AND VIBRATION ELEMENT

Title:

ELEMENT SUBSTRATE, INSPECTION METHOD OF ELEMENT, MANUFACTURING METHOD OF ELEMENT, AND VIBRATION ELEMENT

Document Type and Number:

Japanese Patent JP2016131172

Kind Code:

A

Abstract:

PROBLEM TO BE SOLVED: To provide an element substrate that improves an inspection efficiency of an element and reduces cost.SOLUTION: An element substrate 300 includes an inspection pattern 350, for inspecting a state of processing of dry-etching a gyro element 100, which is an element. The inspection pattern 350 is of a polygonal shape having a portion where a pattern width is narrow.SELECTED DRAWING: Figure 6

Inventors:

YAMADA YOHEI

Application Number:

JP2015003928A

Publication Date:

July 21, 2016

Filing Date:

January 13, 2015

Export Citation:

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Assignee:

SEIKO EPSON CORP

International Classes:

H01L21/66; B81B7/02; B81C1/00; B81C99/00; G01C19/5621; G01C19/5628; H01L41/09; H01L41/332

Attorney, Agent or Firm:

Kazuaki Watanabe
Keisuke Nishida
Satoshi Nakai

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Next Patent: DRY ETCHING METHOD AND METHOD OF MANUFACTURING SILICON DIOXIDE SUBSTRATE