Title:
END EFFECTOR FOR USE IN SPIN-RINSE-DRYER
Document Type and Number:
Japanese Patent JP2010056563
Kind Code:
A
Abstract:
To provide an apparatus that quickly and reliably rinses and dries a semiconductor substrate.
A spin-dryer 101 has a shield system positioned to receive fluid displaced from a substrate 201 vertically positioned within the spin-dryer. The shield system has one or more shields 213, 215, 217 positioned to at least partially reflect fluid therefrom as the fluid impacts the shields. The shields are angled to encourage the flow of fluid therealong, and are preferably hydrophilic to prevent droplets from forming. A pressure gradient is applied across the interior of the spin-dryer to create an air flow which encourages fluid to travel along the shield system in a desired direction.
Inventors:
ANWAA HUSSEIN
BRIAN BROWN
DAVID ANDEIIN
SUVETORANA SHARMAN
WHITE JOHN
BRIAN BROWN
DAVID ANDEIIN
SUVETORANA SHARMAN
WHITE JOHN
Application Number:
JP2009269182A
Publication Date:
March 11, 2010
Filing Date:
November 26, 2009
Export Citation:
Assignee:
APPLIED MATERIALS INC
International Classes:
B08B3/04; H01L21/304; F26B5/08; H01L21/00
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yuichi Yamada
Ikeda adult
Yuichi Yamada
Ikeda adult
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