Title:
ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEM USED IN WAFER MANUFACTURING
Document Type and Number:
Japanese Patent JP2023181414
Kind Code:
A
Abstract:
To provide an energy filter element for an ion implantation system used in wafer manufacturing.SOLUTION: The present invention relates to an implantation device, an injection system, and a method. The implantation device includes a filter frame and a filter held by the filter frame, and the filter is designed to be irradiated with ion beam.SELECTED DRAWING: Figure 4
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Inventors:
FLORIAN KRIPPENDORF
CONSTANTIN CSATO
CONSTANTIN CSATO
Application Number:
JP2023187393A
Publication Date:
December 21, 2023
Filing Date:
November 01, 2023
Export Citation:
Assignee:
MI2 FACTORY GMBH
International Classes:
H01J37/317; H01J37/04
Attorney, Agent or Firm:
Ariga International Patent Office