Title:
時分割多重プロセスにおける包絡線フォロア終点検出
Document Type and Number:
Japanese Patent JP2007501532
Kind Code:
A
Abstract:
The present invention provides a method and an apparatus for establishing endpoint during an alternating cyclical etch process or time division multiplexed process. A substrate is placed within a plasma chamber and subjected to an alternating cyclical process having an etching step and a deposition step. A variation in plasma emission intensity is monitored using known optical emission spectrometry techniques. An amplitude information is extracted from a complex waveform of the plasma emission intensity using an envelope follower algorithm. The alternating cyclical process is discontinued when endpoint is reached at a time that is based on the monitoring step.
Inventors:
Westerman, Russell
Johnson, David, Jay.
Johnson, David, Jay.
Application Number:
JP2006532855A
Publication Date:
January 25, 2007
Filing Date:
May 06, 2004
Export Citation:
Assignee:
Unaxis USA, Inc.
International Classes:
H01L21/3065; G01L21/30; H01J37/32; H01L21/66
Domestic Patent References:
| JP2001044171A | 2001-02-16 | |||
| JP2001319924A | 2001-11-16 | |||
| JP2001501041A | 2001-01-23 | |||
| JPS61193505A | 1986-08-28 | |||
| JPS635529A | 1988-01-11 | |||
| JP2000331985A | 2000-11-30 | |||
| JPH05114586A | 1993-05-07 | |||
| JP2001044171A | 2001-02-16 | |||
| JP2001319924A | 2001-11-16 | |||
| JP2001501041A | 2001-01-23 | |||
| JPS61193505A | 1986-08-28 | |||
| JPS635529A | 1988-01-11 |
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Katsunori Ando
Yukihiro Ikeda
Hajime Asamura
Katsunori Ando
Yukihiro Ikeda