Title:
ENVIRONMENTAL SYSTEM INCLUDING VACUUM SCAVENGE FOR AN IMMERSION LITHOGRAPHY APPARATUS
Document Type and Number:
Japanese Patent JP2015029153
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an environmental system for controlling an environment of a gap between an optical assembly and a device.SOLUTION: A fluid barrier (254) is arranged in the vicinity of a device (30), and an immersion lithography apparatus (252) flows out the immersion fluid (248) filling the gap (246). The immersion lithography system (252) collects the immersion fluid (248) directly existing between the fluid barrier (254) and the device (30), the fluid barrier (254) may comprise a discharge inlet arranged in the vicinity of the device (30), and the immersion lithography system (252) may comprise a low pressure source in communication with the discharge inlet. The environmental system (26) comprises a bearing fluid source feeding between the fluid barrier (254) and the device (30) so as to support the fluid barrier (254 with respect to the device (30).
Inventors:
HAZELTON ANDREW J
SOGARD MICHAEL
SOGARD MICHAEL
Application Number:
JP2014227827A
Publication Date:
February 12, 2015
Filing Date:
November 10, 2014
Export Citation:
Assignee:
NIKON CORP
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JPH10303114A | 1998-11-13 |
Foreign References:
| WO1999049504A1 | 1999-09-30 | |||
| US20020020821A1 | 2002-02-21 | |||
| WO1999049504A1 | 1999-09-30 | |||
| US20020020821A1 | 2002-02-21 |
Attorney, Agent or Firm:
Seiji Ono
Eiryou Kobayashi
Shinji Kato
Mamoru Suzuki
Hiroshi Otani
Eiryou Kobayashi
Shinji Kato
Mamoru Suzuki
Hiroshi Otani