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Title:
EPOXY RESIN COMPOSITION AND SEMICONDUCTOR APPARATUS
Document Type and Number:
Japanese Patent JP2000143771
Kind Code:
A
Abstract:

To obtain the subject composition having excellent solder crack resistance, having improved normal-temperature storage characteristics while maintaining curability in molding, useful for a semiconductor apparatus, etc. by mixing an epoxy resin with a phenol resin curing agent in a specific ratio.

This composition comprises (A) an epoxy resin of formula I (R1 is H, methyl, ethyl or the like), (B) a phenyl resin curing agent, (C) a curing promoter and (D) fused silica powder as essential components. The amount of the curing promoter of formula II (R2 is a group of formula III or the like) is ≥50 wt.% based on the total amount of the component C. The blending ratio of the component A to the component B is 1.1-1.4 epoxy group to 1 phenolic hydroxyl group. The total amount of the component C comprises 50-90 wt.% of the curing promoter of formula II and 10-50 wt.% of triphenyl phosphine. The total amount of U and Th in the whole component is preferably ≤2 ppb.


Inventors:
UEDA SHIGEHISA
Application Number:
JP27683698A
Publication Date:
May 26, 2000
Filing Date:
September 30, 1998
Export Citation:
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Assignee:
SUMITOMO BAKELITE CO
International Classes:
C08K3/36; C08G59/24; C08G59/40; C08L63/00; H01L23/29; H01L23/31; (IPC1-7): C08G59/24; C08G59/40; C08K3/36; C08L63/00; H01L23/29; H01L23/31



 
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