EPOXY VINYL ESTER RESIN AND METHOD FOR PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION AND CURED PRODUCT THEREOF, ACID PENDANT EPOXY VINYL ESTER RESIN, ALKALI-DEVELOPING PHOTOSENSITIVE RESIN COMPOSITION AND CURED PRODUCT THEREOF

Title:

Document Type and Number:

Japanese Patent JP2007326933

Kind Code:

A

Abstract:

To provide a photosensitive resin composition excellent in storage stability and photosensitivity, and to provide a cured product thereof.

The photosensitive resin composition comprises an epoxy vinyl ester resin and a photo polymerization initiator as essential components. The epoxy vinyl ester resin is obtained by reacting an epoxy resin having as a substituent a 1-4C alkyl group at the β-position of an epoxy group with an unsaturated monobasic acid. In the molecular structure of the epoxy vinyl ester resin, the unsaturated monobasic acid is added at a position such that the proportion of a structure represented by general formula (2) (wherein R1represents an alkyl group; and R2represents a hydrogen atom or a methyl group) is 95 mol% or more.

Inventors:

MORINAGA KUNIHIRO
OGURA ICHIRO
MURATA YOSHIAKI

Application Number:

JP2006158415A

Publication Date:

December 20, 2007

Filing Date:

June 07, 2006

Export Citation:

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Assignee:

DAINIPPON INK & CHEMICALS

International Classes:

C08G59/14; C08F299/02; G03F7/027

Domestic Patent References:

JPH0543654A	1993-02-23
JPS5072990A	1975-06-16
JPS4944801A	1974-04-27
JPS4953682A	1974-05-24
JPH1129527A	1999-02-02
JPH08165327A	1996-06-25

Foreign References:

WO2004104683A1

2004-12-02

Other References:

JPN6012042438; 化学大事典１３９版, 20060615, ９６８, 南條　光章

Attorney, Agent or Firm:

Kono Tsuyo

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