Title:
複数の小ビームを発生させるための装置
Document Type and Number:
Japanese Patent JP2006520078
Kind Code:
A
Abstract:
The invention relates to an apparatus for generating a plurality of charged particle beamlets and a charged particle beam lithography system comprising such an apparatus, said apparatus comprising:
a charged particle source (1) for generating a diverging charged particle beam;
a collimating means (4) for collimating said diverging charged particle beam, wherein said collimating means comprises at least one deflector array,
said deflector array adapted for having a voltage applied to each deflector of said deflector array for deflecting a beamlet (8),
wherein at least one deflector of said deflector array is adapted to assert a deflecting effect proportional to its distance with respect the optical axis of the beam.
Inventors:
Kruit, Peter
Application Number:
JP2006507851A
Publication Date:
August 31, 2006
Filing Date:
March 10, 2004
Export Citation:
Assignee:
Mapper Lithography IPB.V.
International Classes:
H01J37/12; G03F7/20; H01J3/02; H01J3/07; H01J3/14; H01J3/26; H01J37/06; H01J37/063; H01J37/09; H01J37/147; H01J37/305; H01J37/317; H01L21/027; G09G
Attorney, Agent or Firm:
Takehiko Suzue
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Takashi Mine
Yoshihiro Fukuhara
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Ryo Hashimoto
Tetsuya Kazama
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Takashi Mine
Yoshihiro Fukuhara
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Ryo Hashimoto
Tetsuya Kazama