Title:
半導体を生産するための設備、付随するポンピング装置および基板ホルダー
Document Type and Number:
Japanese Patent JP2011504298
Kind Code:
A
Abstract:
The invention relates to a piece of equipment for producing semiconductors, comprising a process chamber (2), a substrate holder (5) for holding a substrate (6) for processing within said chamber (2) and a pumping device (4), comprising a vacuum pump (7) in which a flow of gas for pumping may flow between a gas inlet (9) and a gas outlet (10) of which said inlet (9) is connected to the process chamber (2), the substrate holder (5) and the vacuum pump (7) being in the same axis (12), the substrate holder (5) being arranged upstream of said inlet (9) of said vacuum pump (7) in the flow of gas for pumping, characterised in that the pumping device (4) comprises a gas pressure regulation means (8) at the outlet (10) of the vacuum pump (7), for controlling the pressure of the gas at the inlet (9) of the vacuum pump (7) and that the substrate holder (5) comprises at least three support branches (21) connected to a support (20) on the substrate holder (5) in order to fix the support (20) to the process chamber (2) and to provides services to the support (20), at least one branch (21) comprising at least one duct (22), for the passage of said services.
Inventors:
Macan, Philip
Application Number:
JP2010534526A
Publication Date:
February 03, 2011
Filing Date:
November 21, 2008
Export Citation:
Assignee:
Alcatel-Lucent
International Classes:
H01L21/3065; C23C16/455; C23C16/505; H01L21/205; H01L21/31
Attorney, Agent or Firm:
Kawaguchi International Patent Office