Title:
エッチングおよびドーピング複合物質
Document Type and Number:
Japanese Patent JP5535851
Kind Code:
B2
Abstract:
The present invention relates firstly to HF/fluoride-free etching and doping media which are suitable both for the etching of inorganic layers and also for the doping of underlying layers. The present invention secondly also relates to a process in which these media are employed.
Inventors:
Klein, Silke
Kuberbeck, Armin
Stork, Werner
Schmidt, Wilfried
Schaum, Bertholt
Kuberbeck, Armin
Stork, Werner
Schmidt, Wilfried
Schaum, Bertholt
Application Number:
JP2010211256A
Publication Date:
July 02, 2014
Filing Date:
September 21, 2010
Export Citation:
Assignee:
Merck Patent Gesellschaft mit beschraenkter Haftung
International Classes:
H01L21/306; H01L31/06; C09K13/04; H01L21/311; H01L31/0216; H01L31/04
Domestic Patent References:
| JP2000183379A | ||||
| JP52075986A | ||||
| JP61278174A | ||||
| JP2000309869A | ||||
| JP8017789A | ||||
| JP64044074A | ||||
| JP2002539615A |
Attorney, Agent or Firm:
Kiyoji Kuzuwa