Title:
エッチング液組成物
Document Type and Number:
Japanese Patent JP3630168
Kind Code:
B2
Abstract:
PCT No. PCT/GB93/01003 Sec. 371 Date Dec. 19, 1994 Sec. 102(e) Date Dec. 19, 1994 PCT Filed May 17, 1993 PCT Pub. No. WO93/23493 PCT Pub. Date Nov. 25, 1993.An aqueous composition for etching and cleaning semiconductor devices comprises a solution of an acid and a surfactant which is a branched chain aliphatic amine having the formula CmH2m+3N, where m is an integer from 7 to 10. The compositions are stable for long periods of time and do not suffer foaming problems when used in recirculation filtration systems.
Inventors:
Matanagan, David Sean
Application Number:
JP52001193A
Publication Date:
March 16, 2005
Filing Date:
May 17, 1993
Export Citation:
Assignee:
Micro-Image Technology Limited
International Classes:
C09K13/06; C09K13/08; C11D1/62; C11D3/04; C11D3/20; C11D7/08; C11D7/10; C11D7/32; C23F1/14; C23F1/16; C11D1/40; H01L21/304; H01L21/306; H01L21/308; (IPC1-7): H01L21/308; C09K13/06; C09K13/08; C11D1/40; C11D1/62; C11D3/04; C11D3/20; C11D7/08; H01L21/304
Domestic Patent References:
| JP48017438A | ||||
| JP47042438A | ||||
| JP3179737A | ||||
| JP58055323A | ||||
| JP58055324A | ||||
| JP4302428A | ||||
| JP63283028A |
Attorney, Agent or Firm:
Michiteru Soga
Yoshio Kobayashi
Yutaka Ikeya
Hidetoshi Furukawa
Suzuki Kenchi
Masahisa Hase
Tetsuo Kuroiwa
Yoshio Kobayashi
Yutaka Ikeya
Hidetoshi Furukawa
Suzuki Kenchi
Masahisa Hase
Tetsuo Kuroiwa