Title:
ETCHING TREATING DEVICE FOR GRAVURE CYLINDER
Document Type and Number:
Japanese Patent JP3480656
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To depolarize the directional property of an etching hole by spraying etching liquid while a nozzle is swayed between a spraying reference line and a spraying auxiliary line at further upside than this in the gravity effecting direction with respect to a gravure cylinder.
SOLUTION: This device is constituted such as a nozzle 10 is formed to be swayable between a spraying reference line Z and a spraying auxiliary line at further upside than this in the gravity effecting direction with respect to a gravure cylinder 1, and while being swayed continuously therebetween, etching liquid is sprayed. When etching liquid is sprayed from the nozzle 10 along the spraying reference line Z, an etching hole 3 is formation hastened as a width between axes Z1, Z2 about the spraying reference line Z. When this turns to the R direction, a spraying point from the nozzle 10 moves to the spraying auxiliary line Za only at an angle of θ. Accordingly, only the downside in the gravity effecting direction at the upside in the rotating R direction of the etching hole 3 is prevented from being etched uniformly intensively.
Inventors:
Seiji Sakamaki
Hitoshi Susukida
Shigeyuki Watanabe
Hitoshi Susukida
Shigeyuki Watanabe
Application Number:
JP6764397A
Publication Date:
December 22, 2003
Filing Date:
March 21, 1997
Export Citation:
Assignee:
Dainippon Screen Mfg. Co., Ltd.
Armex Co., Ltd.
Armex Co., Ltd.
International Classes:
B41C1/00; C23F1/08; C25F7/00; (IPC1-7): C23F1/08
Domestic Patent References:
| JP559576A | ||||
| JP9268384A | ||||
| JP4191383A | ||||
| JP60239753A | ||||
| JP5613796B2 |
Attorney, Agent or Firm:
Etsuo Nagashima
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