Title:
ETHER MONOMER WITH POLYCYCLIC STRUCTURE, PHOTOSENSITIVE POLYMER AND CHEMICALLY AMPLIFYING TYPE RESIST COMPOSITION OBTAINED THEREFROM
Document Type and Number:
Japanese Patent JP2002348325
Kind Code:
A
Abstract:
To provide a monomer with a polycyclic structure that has an alkenyl ether as a basic structure, a photosensitive polymer as a polymer product therefrom, and a resist composition comprising the polymer.
This photosensitive polymer has a monomer unit having a structure represented by the following formula (wherein R4 and R5 are each hydrogen atom or a methyl group; and R6 and R7 are each independently a hydrogen atom, a hydroxyl group, or a 1-20C hydrocarbon group that may comprise an oxygen atom and/or a halogen atom).
Inventors:
KIM HYUN-WOO
WOO SANG-GYUN
LEE SUNG-HO
WOO SANG-GYUN
LEE SUNG-HO
Application Number:
JP2002124336A
Publication Date:
December 04, 2002
Filing Date:
April 25, 2002
Export Citation:
Assignee:
SAMSUNG ELECTRONICS CO LTD
International Classes:
C07D315/00; C07D311/78; C08F34/02; G03F7/004; G03F7/039; H01L21/027; (IPC1-7): C08F34/02; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Mikio Hatta (4 outside)