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Patent Searching and Data


Title:
ETHER MONOMER WITH POLYCYCLIC STRUCTURE, PHOTOSENSITIVE POLYMER AND CHEMICALLY AMPLIFYING TYPE RESIST COMPOSITION OBTAINED THEREFROM
Document Type and Number:
Japanese Patent JP3970673
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a monomer with a polycyclic structure that has an alkenyl ether as a basic structure, a photosensitive polymer as a polymer product therefrom, and a resist composition comprising the polymer.
SOLUTION: This photosensitive polymer has a monomer unit having a structure represented by the following formula (wherein R4 and R5 are each hydrogen atom or a methyl group; and R6 and R7 are each independently a hydrogen atom, a hydroxyl group, or a 1-20C hydrocarbon group that may comprise an oxygen atom and/or a halogen atom).


Inventors:
金 賢 友
禹 相 均
李 性 昊
Application Number:
JP2002000124336
Publication Date:
September 05, 2007
Filing Date:
April 25, 2002
Export Citation:
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Assignee:
Samsung Electronics Co.,Ltd.
International Classes:
C07D315/00; C08F34/02; C07D311/78; C07D311/94; G03F7/004; G03F7/039; H01L21/027; (IPC1-7): C08F34/02; G03F7/039; H01L21/027
Domestic Patent References:
JP54009275A
Attorney, Agent or Firm:
八田 幹雄
奈良 泰男
宇谷 勝幸