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Title:
EUV LIGHT SOURCE OF LPP METHOD AND ITS GENERATING METHOD
Document Type and Number:
Japanese Patent JP2011054402
Kind Code:
A
Abstract:

To provide an EUV light source of an LPP method and its generating method, capable of greatly enhancing efficiency of using a target material and energy, and capable of restraining generation of debris and degradation of a vacuum degree of a chamber.

The light source includes a vacuum chamber 12 retained in a given vacuum environment, a gas jet device 14 forming a hypersonic steady gas jet 1 of a target material in the vacuum chamber in free recovery, a laser device 16 condensing and irradiating a laser beam 3 to a given condensing point 2 in the hypersonic steady gas jet, and a re-condensing light device 20 reflecting the laser beam 3 which transmits the condensing point, then condensing and irradiating the same condensing point again. The light source generates plasma by exciting the target material by the laser beam 3 at the condensing point 2 to emit extreme ultraviolet light 4 from there.


Inventors:
KUWABARA HAJIME
Application Number:
JP2009000201837
Publication Date:
March 17, 2011
Filing Date:
September 01, 2009
Export Citation:
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Assignee:
IHI CORP
International Classes:
H05G2/00; G03F7/20; H01L21/027
Domestic Patent References:
JP2006210110A2006-08-10
JP2005032510A2005-02-03
JP2004289151A2004-10-14
JP2001108799A2001-04-20
JP2001068296A2001-03-16
JP2001511311A2001-08-07
JP2001143893A2001-05-25
JP2006210110A2006-08-10
JP2005032510A2005-02-03
JP2004289151A2004-10-14
JP2001108799A2001-04-20
JP2001068296A2001-03-16
JP2009016488A2009-01-22
Attorney, Agent or Firm:
堀田 実
野村 俊博