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Title:
EUV LIGHT SOURCE OF LPP METHOD AND ITS GENERATING METHOD
Document Type and Number:
Japanese Patent JP2011054403
Kind Code:
A
Abstract:

To provide an EUV light source of an LPP method and its generating method, capable of greatly enhancing the efficiency of using a target material and energy, and capable of restraining generation of debris and degradation of a vacuum degree of a chamber.

The light source includes a vacuum chamber 12 retained in a given vacuum environment, a gas jet device 14 for forming a hypersonic steady gas jet 1 of a target material in the vacuum chamber in free recovery, and a laser device 16 for crossing a laser beam 3 of the same frequency to a given condensing point 2 in the hypersonic steady gas jet for condensing and irradiation. The laser device includes an interference adjusting device 26 for adjusting interference of a plurality of laser beams at the condensing point, and generates plasma by exciting the target material by the laser beam at the condensing point 2 to emit extreme ultraviolet light 4 from there.


Inventors:
KUWABARA HAJIME
Application Number:
JP2009000201844
Publication Date:
March 17, 2011
Filing Date:
September 01, 2009
Export Citation:
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Assignee:
IHI CORP
International Classes:
H05G2/00; H01L21/027
Domestic Patent References:
JP2001511311A2001-08-07
JP2004510356A2004-04-02
JP2000299197A2000-10-24
JP2003272892A2003-09-26
JP2006303461A2006-11-02
JP2008204815A2008-09-04
JP2007504672A2007-03-01
JP2005032510A2005-02-03
JP2004289151A2004-10-14
JP2003270551A2003-09-25
JP2001108799A2001-04-20
JP2001068296A2001-03-16
Attorney, Agent or Firm:
堀田 実
野村 俊博