Title:
SILICON NITRIDE SUBSTRATE EVALUATION METHOD, EVALUATION DEVICE, AND EVALUATION SYSTEM
Document Type and Number:
Japanese Patent JP2023124795
Kind Code:
A
Abstract:
To provide a method, a device, and a system for evaluating silicon nitride substrates regarding color unevenness and warpage.SOLUTION: A silicon nitride substrate evaluation method for evaluating color unevenness of a silicon nitride substrate is provided, comprising measuring a Raman spectrum at a measurement point on the silicon nitride substrate, measuring the half width of a spectrum peak attributed to silicon nitride lattice vibration included in the Raman spectrum, and evaluating color unevenness of the silicon nitride substrate based on the half width.SELECTED DRAWING: Figure 6
Inventors:
SUENAGA KAZUFUMI
FUKUMOTO REI
KAGA YOICHIRO
FUKUMOTO REI
KAGA YOICHIRO
Application Number:
JP2022189099A
Publication Date:
September 06, 2023
Filing Date:
November 28, 2022
Export Citation:
Assignee:
PROTERIAL LTD
International Classes:
G01N21/65; C04B35/587; H01L23/15
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