Title:
EVANESCENT LIGHT ALIGNER, MASK USED IN THE SAME AND EVANESCENT LIGHT EXPOSING METHOD
Document Type and Number:
Japanese Patent JP3950538
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an evanescent light aligner capable of easily performing a batch exposure whose wavelength is equal to or less than that of light.
SOLUTION: A cylinder 106 is connected to a pressure container 103 whose inside is filled with a refractive index adjusting liquid 105. The pressure of the liquid 105 inside the container 103 can be adjusted by driving the cylinder 106 through a piston driving motor 108. A glass window 114 for introducing a laser 112 which becomes parallel light by a collimator lens 113 after being emitted from a laser 111 is provided on the container 103. A substrate 102 is mounted on a stage 110 and resist 109 is applied on the surface of the substrate 102. An evanescent light mask 101 is constituted of an evanescent light mask base material 104 and an evanescent light mask metal pattern 115 and attached to the container 103 so that the surface 101a is opposed to the substrate 102 for being worked and the back surface 101b is brought into contact with the liquid 105.
Inventors:
Ryo Kuroda
Yasuhiro Shimada
Tsutomu Ikeda
Yasuhiro Shimada
Tsutomu Ikeda
Application Number:
JP35533697A
Publication Date:
August 01, 2007
Filing Date:
December 24, 1997
Export Citation:
Assignee:
Canon Inc
International Classes:
G03F7/20; G03F1/60; H01L21/027; (IPC1-7): G03F7/20; G03F1/14; H01L21/027
Domestic Patent References:
| JP8179493A | ||||
| JP55059721A | ||||
| JP61294820A | ||||
| JP63053554A | ||||
| JP3261807A | ||||
| JP9007935A |
Attorney, Agent or Firm:
Akio Miyazaki
Shinichi Iwata
Masaaki Ogata
Nobuyuki Kaneda
Ishibashi Masayuki
Katsuhiro Ito
Shinichi Iwata
Masaaki Ogata
Nobuyuki Kaneda
Ishibashi Masayuki
Katsuhiro Ito
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