Title:
蒸着マスクおよびその製造方法
Document Type and Number:
Japanese Patent JP7122278
Kind Code:
B2
Abstract:
To provide a vapor deposition mask and a production method for the same, which enable that the vapor deposition mask is made large while reducing a production cost, a flatness of the vapor deposition mask is maintained, and excellent reproduction accuracy and deposition accuracy are kept, in the vapor deposition mask in a form supporting a mask main body by a frame.SOLUTION: The vapor deposition mask 1 includes: the mask main body 2 with a vapor deposition pattern 6 including multiple independent through-holes 5; and the frame 3 arranged around the mask main body. A support frame 46 is fixed to a bottom face side of the frame 3. A frame opening 48 corresponding to a mask opening 11 of the frame 3 is formed in the support frame 46, and the frame opening 48 is formed in a one size larger opening shape than the mask opening 11. Thereby, a structural strength and robustness of a whole evaporation mask are reinforced, and flatness is maintained by preventing the vapor deposition mask from being warp-deformed, making reproduction accuracy and vapor deposition accuracy of a vapor deposition layer excellent.SELECTED DRAWING: Figure 18
Inventors:
Hirohito Tamaru
Yoshihiro Kobayashi
Kiichiro Ishikawa
Yoshihiro Kobayashi
Kiichiro Ishikawa
Application Number:
JP2019048122A
Publication Date:
August 19, 2022
Filing Date:
March 15, 2019
Export Citation:
Assignee:
Maxell Co., Ltd.
International Classes:
C23C14/04; C25D1/08; H01L51/50; H05B33/10
Domestic Patent References:
| JP2003231964A |