蒸着マスクの製造方法、蒸着マスク、及び蒸着マスクを作製するための給電板

Title:

蒸着マスクの製造方法、蒸着マスク、及び蒸着マスクを作製するための給電板

Document Type and Number:

Japanese Patent JP7169534

Kind Code:

B2

Abstract:

To provide a method of producing a vapor deposition mask, capable of more surely preventing a resist pattern from peeling off from a feeding surface and preventing a damage such as plastic deformation and a crack from occurring on a base mask in a peeling process.SOLUTION: The method of producing a vapor deposition mask comprises: a preparation process of preparing a feeding plate 51 having a feeding surface 511 constituted of a conductive material; a first resist forming process of forming a first resist pattern having a pattern corresponding to a plurality of through holes on the feeding surface 511; a base mask production process of forming a metal layer on the feeding surface by carrying out a plating treatment in gaps of the resist pattern to obtain a base mask having a plurality of through holes penetrating the metal layer; and a peeling process of peeling off the base mask from the feeding surface, with the feeding surface 511 of the feeding plate 51 having Sdr of 0.0002 or more and 0.0010 or less.SELECTED DRAWING: Figure 8

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JPS5119650	DENKIKAMISORINO SOTOBA
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Inventors:

Miyatani Isao
Isao Inoue

Application Number:

JP2018144457A

Publication Date:

November 11, 2022

Filing Date:

July 31, 2018

Export Citation:

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Assignee:

Dai Nippon Printing Co.,Ltd.

International Classes:

C25D1/08; C23C14/04; H01L27/32; H01L51/50; H05B33/10

Domestic Patent References:

JP2009541962A
JP2016199775A
JP2017193775A
JP2017020080A
JP2018095958A
JP6120039B1

Foreign References:

WO2017013903A1

Attorney, Agent or Firm:

Hiroyuki Nagai
Nakamura Yukitaka
Yasukazu Sato
Satoru Asakura
Yukihiro Hotta
Kazuo Okamura

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