EVAPORATION SOURCE FOR ORGANIC MATERIAL AND ORGANIC THIN FILM FORMING APPARATUS USING THE SAME

Japanese Patent JP3483719

B2

PROBLEM TO BE SOLVED: To form org. thin films by exactly controlling the evaporation rate of an additive material with respect to a main material to a prescribed very low rate.
SOLUTION: This org. thin film forming apparatus 1 has an evaporation source 3A for the main material and an evaporation source 3B for the additive. The evaporation source 3B for the additive material has a vessel 33 for evaporation housing the additive material 36. The vessel 33 for evaporation has a first crucible 31 of a blind hollow cylindrical shape housing the additive material 36 and a second crucible 32 of a blind hollow cylindrical shape having a diameter smaller than the diameter of a vessel body 31. The bottom 32A of the second crucible 32 is provided with a hole part 32a as an orifice part, The second crucible 32 is inserted and fixed into the first crucible 31, by which an evaporation chamber 33A is formed. The bottom 32A of the second crucible 32 is inserted down to the position in proximate to the additive material 36 in the first crucible 31.

JP2007126727	CONTAMINATION-PREVENTING DEVICE FOR VACUUM DEPOSITION
WO/2012/070403	DISILOXANE DERIVATIVE HAVING SILACYCLOALKANE STRUCTURE, METHOD FOR PRODUCING DISILOXANE DERIVATIVE, FILM PRODUCED USING DISILOXANE DERIVATIVE, METHOD FOR PRODUCING THIS FILM, AND MATERIAL AND ELECTRONIC DEVICE USING THIS FILM
WO/2006/052467	CONTROLLING THE APPLICATION OF VAPORIZED ORGANIC MATERIAL

Naoki Nagashima
Natsuki Takahashi
Toshio Negishi

JP1335297A

January 06, 2004

January 09, 1997

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ULVAC, Inc.

C23C14/12; C23C14/24; (IPC1-7): C23C14/12; C23C14/24

JP6223970A
JP2270959A
JP290662U

Shigeo Ishijima (1 outside)

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