PURPOSE: To provide an evaporator for material liquid in which an operation is facilitated in a simple structure in the evaporator for organic metal material liquid to be used for a MOCVD apparatus.

CONSTITUTION: Carrier gas is introduced into an evaporator 11 for semiconductor vapor growth material liquid 1, material liquid component is carried to the gas, and introduced into a reaction vessel for a vapor growth apparatus. The evaporator 11 is separated into a material liquid supply chamber 12 and a bubbling chamber 13. A partition plate 16 having a material liquid supply port 14 for making the liquid 1 pass at a lower part and a liquid level regulating port 15 for regulating a height of a liquid level 4 in which the gas is passed at a central part is provided, and an indoor pressure sensing pressure gage 17 and an indoor exhaust tube 18 are provided in the chamber 12. A carrier gas inlet tube 19 and an exhaust tube 21 for feeding the gas in which the liquid is bubbled and liquid component is carried into a vessel are provided in the chamber 13.