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Title:
EXAMINING METHOD OF SHADOW MASK
Document Type and Number:
Japanese Patent JPH10208640
Kind Code:
A
Abstract:

To provide an examining method to improve the examining accuracy, and to eliminate pseudo errors, in the examining method of a shadow mask which decides the examination of the forms of through holes by irradiating the light to the shadow mask.

In this examining method, the light is irradiated from one surface side of a shadow mask 6 having plural through holes which are made by combining small hole recesses formed on one side surface of a metal sheet, and large hole recesses formed on the other side surface, and it is examined and decided whether the forms of the through holes 5 are in the desired form or not depending on the light passing through the through holes. In this case, the shadow mask 6 is loaded on a frame form examination board 7 having an opening 13 by making the above large hole recesses side at the lower side, and then, the light is irradiated from one surface side of the shadow mask 6, and it is examined whether the forms of the through holes are made in a desired form or not, depending on the light passing through the through holes 5.


Inventors:
YAGO KYUICHI
Application Number:
JP736997A
Publication Date:
August 07, 1998
Filing Date:
January 20, 1997
Export Citation:
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Assignee:
TOPPAN PRINTING CO LTD
International Classes:
G01B11/24; G01M11/00; G01N21/88; H01J9/14; H01J9/42; (IPC1-7): H01J9/42; G01B11/24; G01M11/00; G01N21/88; H01J9/14