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Title:
EXPOSING, COATING AND DEVELOPING DEVICE, AND RESIST PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP2000089475
Kind Code:
A
Abstract:

To improve the contllability of the line width of a resist pattern, to suppress occurrence of microbubbles on the interface between the resist and developer, and to decrease developing defects.

This device is equipped with a coating part to apply a resist on a semiconductor substrate, an irradiating part 12 of light to irradiate the resist surface with light (UV rays) to increase hydrophilicity of the resist surface, a projecting part 8 of exposure light to expose the resist through a reticle having a specified pattern as a mask to transfer the pattern of the reticle, and a developing part 11 to supply a developer to the resist to pattern the resist. By using the device, the resist surface is irradiated with light before projecting the exposure light.


Inventors:
NOHAMA SHIYOUJI
Application Number:
JP25857998A
Publication Date:
March 31, 2000
Filing Date:
September 11, 1998
Export Citation:
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Assignee:
SONY CORP
International Classes:
H01L21/027; G03F7/16; G03F7/30; G03F7/38; (IPC1-7): G03F7/38; G03F7/16; G03F7/30; H01L21/027
Attorney, Agent or Firm:
Takahisa Sato