To realize seamless exposing, not only in the orthogonal direction to the scanning direction but also in the direction along the scanning direction.

Blinds 111Y1, 111Y2 which move forward and backward in direction Y for an illumination beam IL are moved before and after irradiation of the lighting beam IL, having constant width in the direction Y along the moving direction of the reticle Ri and substrate 4 for irradiation of the illumination beam IL, while the width in the direction Y of the lighting beam IL is changed as a whole for the direction X so that a sloping distribution of accumulated energy is attained on a sensitive body. Moreover, the amount of exposure at the end part in the direction X of the lighting beam IL, passing through a slit 133 formed to a fixed slit plate SB, is changed in the manner of a sloping line by a concentration filter Fj.