Title:
EXPOSING METHOD AND EXPOSING DEVICE
Document Type and Number:
Japanese Patent JP2007093823
Kind Code:
A
Abstract:
To provide a correction of an exposure width, which is necessary when line widths and spacings are so small that required line widths are not obtained in exposing and developing a wiring pattern.
By using light with a wide irradiation area in exposing, adjacent wires are also slightly exposed, consequently a plurality of wires are irradiated in a high density region, thereby an integral of energy is accumulated and the correction of the exposure width (a line width or a spacing) is achieved. In addition, the light is obtained by interposing a filter constructed by combining concentrical units with mutually different transmittance between a light source in an exposing device and an object to be irradiated.
Inventors:
MINE TOSHIHIRO
HASHIMOTO YUTAKA
MATSUKAWA KIYONAGA
HASHIMOTO YUTAKA
MATSUKAWA KIYONAGA
Application Number:
JP2005281079A
Publication Date:
April 12, 2007
Filing Date:
September 28, 2005
Export Citation:
Assignee:
HITACHI LTD
International Classes:
G03F7/20; H05K3/00
Attorney, Agent or Firm:
Manabu Inoue
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