Title:
EXPOSURE DEVICE, EXPOSURE METHOD, AND ARTICLE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2023039136
Kind Code:
A
Abstract:
To achieve both highly-accurate positioning and high productivity.SOLUTION: An exposure device includes a first measurement part for detecting an original plate mark and a first mark, a second measurement part for detecting a second mark, a storage part for storing a difference between the position of the first mark obtained by detecting the first mark by the first measurement part when a projection optical system is in a first state, and the position of the first mark obtained by detecting the first mark by the first measurement part when the projection optical system is in a second state different from the first state, and a control part for controlling positioning between the original plate and a shot region of a substrate, wherein the control part acquires a detection result obtained by performing detection of the original plate mark by the first measurement part, detection of the first mark by the first measurement part and detection of the second mark by the second measurement part in parallel, when the projection optical system is in the first state, and controls positioning between the original plate and the shot region of the substrate on the basis of the detection result and the difference when the projection optical system is in the second state.SELECTED DRAWING: Figure 4
Inventors:
YAMAGUCHI SEIJI
INAMURA EIJI
KIJIMA WATARU
SOSAKO RYO
INAMURA EIJI
KIJIMA WATARU
SOSAKO RYO
Application Number:
JP2021146151A
Publication Date:
March 20, 2023
Filing Date:
September 08, 2021
Export Citation:
Assignee:
CANON KK
International Classes:
G03F9/00; G03F7/20
Attorney, Agent or Firm:
Takuma Abe
Sougo Kuroiwa
Sougo Kuroiwa