To form a lighting region having a trapezoidal light intensity distribution along a predetermined direction on a photosensitive substrate, and to vary a blur width of the lighting region within a necessary range.

An exposure apparatus which includes lighting systems (1 to 7) configured to light up a predetermined pattern (M), and exposes the photosensitive substrate (W) to the pattern, includes an imaging optical system (7: 7a, 7b) disposed in an optical path of the lighting systems to form a conjugate plane which is optically conjugate to a plane of the pattern, a light blocking member (6) which blocks part of luminous flux along a plane nearby the conjugate plane in order to shape a light intensity distribution of the lighting region to be formed on the photosensitive substrate, along a first direction (Y direction) into a trapezoid shape, and a control unit (CR) which changes a position relation between the conjugate plane and a light blocking plane of the light blocking member so as to vary the width of a width of an end region corresponding to an oblique side of the light intensity distribution in the trapezoid shape in the lighting region.