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Title:
EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2014099649
Kind Code:
A
Abstract:

To provide an exposure apparatus which maintains a liquid immersion region in a desired state, and can excellently carry out exposure processing.

An exposure apparatus EX exposes a substrate P by irradiating the substrate P with exposure light EL through a projection optical system PL and liquid LQ. The exposure apparatus EX is provided with a liquid immersion mechanism 1 for supplying the liquid LQ and also recovering the liquid LQ. The liquid immersion mechanism 1 has an inclined plane 2 which is formed so as to face a surface of the substrate P, and a liquid recovering port 22 of the liquid immersion mechanism 1 is formed on the inclined plane 2.


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Inventors:
NAGASAKA HIROYUKI
OKUYAMA TAKESHI
Application Number:
JP2014018538A
Publication Date:
May 29, 2014
Filing Date:
February 03, 2014
Export Citation:
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Assignee:
NIKON CORP
NIKON ENGINEERING CO LTD
International Classes:
H01L21/027; G02B19/00; G03F7/20
Domestic Patent References:
JP2005167211A2005-06-23
JP2004356205A2004-12-16
JP2005020013A2005-01-20
JP2005045223A2005-02-17
JP2005167211A2005-06-23
Foreign References:
WO1999049504A11999-09-30
WO1999049504A11999-09-30
Attorney, Agent or Firm:
Seiji Ohno
Kobayashi Hideyoshi
Shinji Kato
Mamoru Suzuki
Hiroshi Otani



 
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