Title:
EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DEVICE
Document Type and Number:
Japanese Patent JP2010171451
Kind Code:
A
Abstract:
To provide an exposure apparatus which maintains a liquid immersion region in a desired state, and can excellently carry out exposure treatment.
The exposure apparatus EX exposes a substrate P by irradiating the substrate P with exposure light EL through a projection optical system PL and a liquid LQ. The exposure apparatus EX is provided with a liquid immersion mechanism 1 for supplying the liquid LQ and recovering the liquid LQ. The liquid immersion mechanism 1 has an inclined plane 2 which is formed to face the surface of the substrate P, and a liquid recovering port 22 of the liquid immersion mechanism 1 is formed on the inclined plane 2.
Inventors:
NAGASAKA HIROYUKI
OKUYAMA TAKESHI
OKUYAMA TAKESHI
Application Number:
JP2010087342A
Publication Date:
August 05, 2010
Filing Date:
April 05, 2010
Export Citation:
Assignee:
NIKON CORP
NIKON ENGINEERING CO LTD
NIKON ENGINEERING CO LTD
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP2005020013A | 2005-01-20 | |||
| JP2005005713A | 2005-01-06 | |||
| JP2004310016A | 2004-11-04 | |||
| JP2005167211A | 2005-06-23 | |||
| JP2005012228A | 2005-01-13 | |||
| JP2005020013A | 2005-01-20 | |||
| JP2005005713A | 2005-01-06 | |||
| JP2004310016A | 2004-11-04 | |||
| JP2005167211A | 2005-06-23 |
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi
Kazuya Nishi
Tadashi Takahashi
Kazuya Nishi
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