Title:
EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE
Document Type and Number:
Japanese Patent JP2012033924
Kind Code:
A
Abstract:
To correct the distortion of a pattern-projected image due to the thermal expansion of reticles.
Illumination light IL via a reticle R is modulated with the use of a spatial light modulator SL disposed on an image pickup plane of a first optical system (by dividing and reflecting with the use of a plurality of mirror elements), and the modulated illumination light IL is radiated upon a wafer W. Then the distortion of a pattern-projected image due to the thermal expansion of the reticle can be corrected by modulating the illumination light IL according to the thermal expansion deformation of the reticle R.
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Inventors:
YAMATO SOICHI
Application Number:
JP2011151527A
Publication Date:
February 16, 2012
Filing Date:
July 08, 2011
Export Citation:
Assignee:
NIKON CORP
International Classes:
H01L21/027
Attorney, Agent or Firm:
Atsushi Tateishi