To prevent deterioration in drawing quality caused by the displacement of a head in a light beam irradiation device when a substrate is scanned with a plurality of beams by the use of a plurality of light beam irradiation devices.
The position of a chuck 10 is detected, the movement of stages 5, 7 is controlled to position the chuck 10 on the basis of the detection result of the position of the chuck 10, and a light beam projected from a head 20a of a light beam irradiation device 20 is received by a light receiving means 51 provided on the chuck 10. The displacement of the head 20a of each light beam irradiation device 20 is detected by the received beam. Coordinates of drawing data supplied to a DMD (digital mirror device) drive circuit 27 of each beam irradiation device 20 are corrected on the basis of the detection result of the displacement of the head 20a of the light beam irradiation device 20, and drawing data with corrected coordinates are supplied to the DMD drive circuit 27 of each light beam irradiation device 20.
WO/2017/202602 | SELECTION OF SUBSTRATE MEASUREMENT RECIPES |
JPS63101815 | LIGHTING EQUIPMENT |
JP2002535701 | PROBLEM TO BE SOLVED: To form a pattern on a thin film. |
HAYASHI TOMOAKI
UEHARA SATOSHI
KOIZUMI MITSUYOSHI
JP2008233638A | 2008-10-02 | |||
JP2006173470A | 2006-06-29 | |||
JP2007003830A | 2007-01-11 |