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Title:
EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DISPLAY PANEL SUBSTRATE
Document Type and Number:
Japanese Patent JP2010102084
Kind Code:
A
Abstract:

To prevent deterioration in drawing quality caused by the displacement of a head in a light beam irradiation device when a substrate is scanned with a plurality of beams by the use of a plurality of light beam irradiation devices.

The position of a chuck 10 is detected, the movement of stages 5, 7 is controlled to position the chuck 10 on the basis of the detection result of the position of the chuck 10, and a light beam projected from a head 20a of a light beam irradiation device 20 is received by a light receiving means 51 provided on the chuck 10. The displacement of the head 20a of each light beam irradiation device 20 is detected by the received beam. Coordinates of drawing data supplied to a DMD (digital mirror device) drive circuit 27 of each beam irradiation device 20 are corrected on the basis of the detection result of the displacement of the head 20a of the light beam irradiation device 20, and drawing data with corrected coordinates are supplied to the DMD drive circuit 27 of each light beam irradiation device 20.


Inventors:
NEMOTO RYOJI
HAYASHI TOMOAKI
UEHARA SATOSHI
KOIZUMI MITSUYOSHI
Application Number:
JP2008272934A
Publication Date:
May 06, 2010
Filing Date:
October 23, 2008
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP
International Classes:
G03F7/20; G01B11/00; H01L21/027
Domestic Patent References:
JP2008233638A2008-10-02
JP2006173470A2006-06-29
JP2007003830A2007-01-11
Attorney, Agent or Firm:
Kozo Takahashi



 
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