Title:
EXPOSURE APPARATUS
Document Type and Number:
Japanese Patent JP3653265
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an exposure apparatus to expose the both surfaces or one surface of a strip-type or sheet-type work through the pattern of a mask.
SOLUTION: The apparatus is provided with a proximity exposure part and a contact exposure part opposing to each other and has a mask holder for contact exposure as attachable and detachable in the contact exposure part. Specifically, a mount base for a mask/mask alignment mechanism is disposed above the XYθ driving mechanism for mask/work alignment fixed to a base frame, while a table is disposed via the XYθ driving mechanism for mask/mask alignment above the mount base of the mask/mask alignment mechanism. A guide member formed on the lower face of a contact exposure mask holder in the contact exposure part is detachably engaged with a guide formed on the upper face of a supporting column fixed on the table.
Inventors:
Yasuhiko Oshimo
Hisa Tajima
Kurimasa Toshihiko
Mitsuya Nishimura
Hisa Tajima
Kurimasa Toshihiko
Mitsuya Nishimura
Application Number:
JP2002363745A
Publication Date:
May 25, 2005
Filing Date:
December 16, 2002
Export Citation:
Assignee:
Toray Engineering Co., Ltd.
International Classes:
G03F7/20; H05K3/00; (IPC1-7): G03F7/20
Domestic Patent References:
JP2000275862A | ||||
JP57034333A | ||||
JP62211657A | ||||
JP8314158A |
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