To provide an exposure apparatus which is used in a photolithographic process for manufacturing a semiconductor device, liquid crystal display device, thin-film magnetic head, etc., uses a KrF or ArF excimer laser as an exposing light source, and is provided with a shutter which can be opened and closed at high speeds and improved in durability.

In an exposure apparatus which is provided with a shutter SH, that transmits or intercepts light from a light source and transfers a pattern plotted on a reticle R to a substrate W by having the pattern irradiated with a light transmitted through the shutter SH, the shutter SH has two blades which are faced opposite to each other in one direction, perpendicular to the advancing direction of the laser light. Blades 1a and 1b are moved opposite to each other along direction which is perpendicular to the advancing direction of the laser beam synchronously to the opening and closing of the shutter SH to transmit or intercept the light.