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Title:
EXPOSURE CONTROL DEVICE AND EXPOSURE CONTROL METHOD
Document Type and Number:
Japanese Patent JP2012010228
Kind Code:
A
Abstract:

To provide an exposure control device which controls an exposure value to a target value with high responsiveness and high accuracy in a wide exposure adjustment range.

An exposure control device controls exposure in an exposure adjustment range ER by plural exposure adjustment units using an exposure evaluation value EV(pv) based on a luminance signal and an exposure target value EV(sp). The deviation EV(err) between the exposure target value EV(sp) and the exposure evaluation value EV(pv) is calculated. When the deviation EV(err) is in a transient state where it is greater than a predetermined value and the exposure target value EV(sp) is within an aperture exposure control range ER-i, an aperture exposure adjustment unit 61 controls exposure with a main control amount Ci-m and a gain exposure adjustment unit 62 controls exposure with a gain correction amount Cg-s. When the deviation EV(err) is in a steady state where it is smaller than the predetermined value and the exposure target value EV(sp) is within a gain exposure control range ER-g, the gain exposure adjustment unit 62 controls exposure with a main control amount Cg-m and the aperture exposure adjustment unit 61 controls exposure with an aperture correction amount Ci-s.


Inventors:
TOKUCHI MASAAKI
Application Number:
JP2010146075A
Publication Date:
January 12, 2012
Filing Date:
June 28, 2010
Export Citation:
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Assignee:
ELMO CO LTD
International Classes:
H04N5/235; G03B7/097
Domestic Patent References:
JP2000041182A2000-02-08
JPH0564065A1993-03-12
JPH0556334A1993-03-05
Attorney, Agent or Firm:
Meisei International Patent Office