PURPOSE: To reinforce center-emphasized photometry at the time of rear light or excessive follow light and enable photography with the counterlight or excessive follow light by controlling the size and/or position of each exposure detection area according to the state of the rear light or excessive follow light.

CONSTITUTION: The sizes and/or positions of exposure detection areas are controlled according to the state of the counterlight or excessive follow light. Namely, the exposure detection area is divided into an upper and a lower part at the time of forward light; and the lower part is regarded as the exposure detection area A1 where an object is present thereon and the upper part is regarded as the exposure detection area A2. Consequently, there is no variation in brightness even in panning operation. Further, the exposure detection area A1 where the object is present thereon is arranged at the center part at the time of excessive counterlight or forward light, and the exposure detection area A2 with the background is arranged at the peripheral part; and the exposure detection area A1 where the object is present thereon is set small to enable photometry further approaching emphasis on the center. Consequently, the photography in the counterlight or excessive forward light state is available.