To provide an exposure device that causes little decrease in illuminance and no decrease in productivity per unit time even when illumination light to a fly eye lens located in an optical path of the light is physically blocked so as to adjust a collimation half angle.

A proximity exposure device is provided, in which a photomask having a predetermined pattern is laid close to a substrate coated with a photosensitive resin and exposed to exposure light guided transmitted through a fly eye lens via a condensing mirror and guided by a concave mirror. A reflection mirror for reflecting light to the condensing mirror is disposed on a light-entering surface side in a periphery of the fly eye lens; and a light-shielding layer for adjusting a collimation half angle is formed on a light-transmitting surface side of a portion where the reflection mirror is disposed.