Title:
露光装置、液浸部材、露光方法、及びデバイス製造方法
Document Type and Number:
Japanese Patent JP5668825
Kind Code:
B2
Abstract:
An exposure apparatus that exposes a substrate includes: an optical system that includes an emission surface from which an exposure light is emitted; a first surface that is disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface; a second surface that is disposed in at least a part of a surrounding of the first surface and at a position lower than the first surface; a space portion into which a liquid can flow via a first aperture between the first surface and the second surface and which is opened to the atmosphere via a second aperture different from the first aperture; and a first recovery portion that recovers at least a part of the liquid flowing into the space portion. Here, the emission surface, the first surface, and the second surface are opposed to the surface of the substrate in at least a part of the exposure of the substrate, and the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate.
Inventors:
佐藤 真路
Application Number:
JP2013230683A
Publication Date:
February 12, 2015
Filing Date:
November 06, 2013
Export Citation:
Assignee:
株式会社ニコン
International Classes:
H01L21/027; G03F7/20
Attorney, Agent or Firm:
Masatake Shiga
Norio Takahashi
Norio Takahashi