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Patent Searching and Data


Title:
EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2014011203
Kind Code:
A
Abstract:

To provide an exposure device that reduces the occurrence of exposure failures.

An exposure device exposes a substrate with exposure light through a first liquid in a first immersion space. The exposure device includes: an optical member having an emission surface that emits exposure light; a first member that is arranged in at least part of the surroundings of an optical path of the exposure light and that forms the first immersion space of the first liquid; and a second member that is arranged on an outer side of the first member with respect to the optical path and that forms a second immersion space of a second liquid away from the first immersion space.


Inventors:
SATO MASAMICHI
NAGASAKA HIROYUKI
Application Number:
JP2012144783A
Publication Date:
January 20, 2014
Filing Date:
June 27, 2012
Export Citation:
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Assignee:
NIKON CORP
International Classes:
H01L21/027
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi