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Title:
EXPOSURE DEVICE AND EXPOSURE METHOD
Document Type and Number:
Japanese Patent JP2013037300
Kind Code:
A
Abstract:

To provide an exposure device capable of continuously producing a high-image-quality, inexpensive liquid crystal panel at a high yield, in a process for manufacturing a TFT substrate using a gray tone mask and to provide an exposure method.

The exposure device including an illumination optical system and a projection optical system includes effective light source shape adjusting means for changing an effective light source shape in the illumination optical system, stationary distortion variation adjusting means for changing a variation in stationary distortion in the projection optical system, a two-dimensional sensor for forming an image of a pattern on a mask on a plate stage, and an adjusting part for adjusting at least one of the effective light source shape adjusting means and the stationary distortion variation adjusting means based on the resulting image formed by the two-dimensional sensor. The adjusting part adjusts light intensity distribution in the identical pattern to adjust the effective light source shape adjusting means or the stationary distortion variation adjusting means.


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Inventors:
NAGAI YOSHIYUKI
Application Number:
JP2011175493A
Publication Date:
February 21, 2013
Filing Date:
August 11, 2011
Export Citation:
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Assignee:
CANON KK
International Classes:
G03F7/20; G02B19/00; G02F1/13; G02F1/1368; G09F9/00; H01L21/027
Attorney, Agent or Firm:
Yukio Takanashi



 
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