露光装置及び除振装置、システム同定装置及びその方法

Japanese Patent JP4272750

B2

An exposure apparatus includes a motion control system, the motion control system including a structure, a plurality of actuators to apply forces to the structure, respectively, and a plurality of sensors to sense motion states of the structure, respectively. The apparatus includes a pseudo-random signal generator to generate a plurality of pseudo-random signals and to apply the plurality of pseudo-random signals to the plurality of actuators, the plurality of pseudo-random signals being equal in number to a number of degrees of freedom of the motion control system, a storage unit to store a first plurality of time-series data obtained by the plurality of sensors with a second plurality of time-series data corresponding to the plurality of pseudo-random signals, and a characteristic deriving unit to derive a characteristic of the motion control system based on the first and second plurality of time-series data.

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Wakui Shinji
Shuichi Adachi
Takehiko Mayama
Hiroaki Kato

JP16536999A

June 03, 2009

June 11, 1999

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Canon Inc

H01L21/027; F16F15/02; G03F7/20; G05B5/01

JP7325628A
JP3033623A

Yasunori Otsuka
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura

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