PURPOSE: To align a resist without exposing an alignment mark part so that steps under the resist are seen clearly, by using a light source, which emits the light having a wavelength to exposure the resist as the light source only for exposure and providing a light source only for alignment, which emits the light having a wavelength transmitted through the resist, independently of said light source only for exposure.

CONSTITUTION: A light source 4A which emits a light 4 having a wavelength to expose a resist 3 is used as the light source only for exposure, and a light source 5A only for alignment which emits a light 5 having a wavelength transmitted through the resist 3 is provided. In case of alignment, the light source 5A which emits the light 5 having the wavelength transmitted through the resist 3. Thus, an alignment mark 2 on a wafer is not seen as a resist surface image but is seen directly as a pattern 7 patterned on the wafer, and the pattern on the wafer is seen as the clear pattern 7 without influences of the shape of the resist.