Title:
露光装置、露光方法及び物品の製造方法
Document Type and Number:
Japanese Patent JP7378265
Kind Code:
B2
Abstract:
The present invention provides an exposure apparatus that exposes a substrate via an original, including an illumination optical system configured to illuminate the original, and a projection optical system configured to project a pattern of the original onto the substrate, wherein the illumination optical system illuminates the original by illumination light which includes a first portion that enters an incident pupil of the projection optical system and a second portion which enters a region outside the incident pupil, and the first portion and the second portion are separated from each other on an incident pupil plane of the projection optical system.
Inventors:
Yuhei Sumiyoshi
Daisuke Kobayashi
Daisuke Kobayashi
Application Number:
JP2019191156A
Publication Date:
November 13, 2023
Filing Date:
October 18, 2019
Export Citation:
Assignee:
Canon Inc
International Classes:
G03F7/20; G02B19/00
Domestic Patent References:
| JP2007221114A | ||||
| JP2010171447A | ||||
| JP2012019110A | ||||
| JP2014165291A | ||||
| JP2001250761A | ||||
| JP2009010131A |
Foreign References:
| US20090244502 |
Attorney, Agent or Firm:
Patent Attorney Corporation Otsuka International Patent Office
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