Title:
EXPOSURE APPARATUS AND EXPOSURE METHOD
Document Type and Number:
Japanese Patent JP2023140777
Kind Code:
A
Abstract:
To provide, in a technology for exposing a substrate with laser light beam generated from a plurality of light sources, a technology that can appropriately deal with fluctuations in the light source over time that can occur during drawing.SOLUTION: The exposure apparatus and exposure method according to the present invention detect laser light beam on an optical path of laser light beam. When the spot size of a laser light beam detected during execution of drawing deviates from a predetermined appropriate range, a predetermined error processing is executed.SELECTED DRAWING: Figure 8
Inventors:
MISUHATA MINORU
CHICHIBU TAKAO
FUJISAWA YASUMITSU
CHICHIBU TAKAO
FUJISAWA YASUMITSU
Application Number:
JP2022046789A
Publication Date:
October 05, 2023
Filing Date:
March 23, 2022
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD
International Classes:
G03F7/20; H05K3/00
Attorney, Agent or Firm:
Shoichi Swing
Kazumasa Ohnishi
Kazumasa Ohnishi
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