Title:
露光装置、基板処理装置及びリソグラフィシステム、並びにデバイス製造方法
Document Type and Number:
Japanese Patent JP4915033
Kind Code:
B2
Abstract:
The exposure apparatus (10) and the substrate processing unit (50) are connected via an in-line I/F portion (110). In addition, information on the substrate carriage is communicated in between the control unit of the exposure apparatus side and the control unit of the substrate processing unit, and both units decide their next operation that contribute to improving the processing capacity related to the wafer carriage, before actually starting the operation. Therefore, the throughput of the series of wafer processing performed by the substrate processing unit and the exposure apparatus can be improved, and as a consequence, becomes possible to improve the productivity of the device. In this case, for example, information on the predicted time or the expected time when the substrate can be received or sent out is reciprocally communicated between both units.
Inventors:
Hirohiro Fujita
Application Number:
JP2001148056A
Publication Date:
April 11, 2012
Filing Date:
May 17, 2001
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
H01L21/027; G03F7/20; H01L21/677
Domestic Patent References:
| JP10270316A | ||||
| JP10149978A | ||||
| JP2000133577A | ||||
| JP8255750A |
Attorney, Agent or Firm:
Atsushi Tateishi