Title:
EXPOSURE MASK FOR PATTERNING
Document Type and Number:
Japanese Patent JPS53117385
Kind Code:
A
Abstract:
PURPOSE:To make an effective exposure mask by providing patterns of the degrees of transparency of bright, dark and the intermediate of bright and dark on the same mask substrate and making exposed regions of three levels on resist film by one exposure.
Inventors:
MIURA YOSHIO
Application Number:
JP3255677A
Publication Date:
October 13, 1978
Filing Date:
March 23, 1977
Export Citation:
Assignee:
NIPPON ELECTRIC CO
International Classes:
G03C5/00; G03F1/00; G03F1/54; G03F7/004; G03F9/00; H01L21/027; H01L21/302; (IPC1-7): G03C5/00; G03F9/00; H01L21/302